Influence of deposition parameters of Novel Vacuum Coating Plant on evaporated Ni60Fe40 and Ni80Fe20 films

dc.contributor.authorKockar, Hakan
dc.contributor.authorWilliams, Paul
dc.contributor.authorKaraağaç, Öznur
dc.contributor.authorMeydan, Turgut
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.date.accessioned2022-01-12T08:28:48Z
dc.date.available2022-01-12T08:28:48Z
dc.date.issued2009-06
dc.description.abstractThe aim of this study is to deposit and then characterize a large quantity of magnetic materials and understand how the Novel Vacuum Coating Plant (VCP) system affects the properties of the materials. Ni60Fe40 and Ni80Fe20 were the compositions chosen for the investigation. The films were deposited on rigid and flexible substrates using the novel VCP. Data from Inductively Coupled Plasma Atomic Emission Spectrometry analysis performed on the source alloys confirmed that element concentrations were within 0.3% of the compositions. The X-ray diffraction patterns indicated that all films have face-centred cubic structure. Ni60Fe40 films evaporated on a polyimide (kapton (TM)) substrate showed anisotropic behaviour due to the flexible nature of the substrate, aided by the relatively high magnellostriction caused by the composition, whereas the films produced on glass substrates exhibit only isotropic magnetisation irrespective of their compositions. Observations indicate that in-plane anisotropy and coercivity is dependent on the type of substrates and the compositions. All films showed planar magnetic anisotropy. It is seen that large film areas can be produced and their properties were affected by the deposition parameters in the VCP system.en_US
dc.description.sponsorshipBalıkesir Üniversitesi (BAP 2005/18)tr_TR
dc.description.sponsorshipTürkiye Cumhuriyeti Kalkınma Bakanlığı (2005K120170)tr_TR
dc.identifier.citationKoçkar, H. vd. (2009). "Influence of deposition parameters of Novel Vacuum Coating Plant on evaporated Ni60Fe40 and Ni80Fe20 films". Sensor Letters, 7(3), Special Issue, 220-223.en_US
dc.identifier.endpage223tr_TR
dc.identifier.issn1546-198X
dc.identifier.issue3, Special Issueen_US
dc.identifier.scopus2-s2.0-73149113920tr_TR
dc.identifier.startpage220tr_TR
dc.identifier.urihttps://doi.org/10.1166/sl.2009.1052
dc.identifier.urihttps://www.ingentaconnect.com/content/asp/senlet/2009/00000007/00000003/art00003;jsessionid=26hqrrtnq5tgu.x-ic-live-03
dc.identifier.urihttp://hdl.handle.net/11452/24030
dc.identifier.volume7tr_TR
dc.identifier.wos000271193300003
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherAmer Scientific Publishersen_US
dc.relation.collaborationYurt içitr_TR
dc.relation.collaborationYurt dışıtr_TR
dc.relation.journalSensor Lettersen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectMagnetic anisotropyen_US
dc.subjectNife filmsen_US
dc.subjectThermal evaporationen_US
dc.subjectMagnetic-propertiesen_US
dc.subjectInplane anisotropyen_US
dc.subjectThinen_US
dc.subjectAlloysen_US
dc.subjectChemistryen_US
dc.subjectElectrochemistryen_US
dc.subjectInstruments & instrumentationen_US
dc.subjectPhysicsen_US
dc.subjectAtomic emission spectroscopyen_US
dc.subjectCoatingsen_US
dc.subjectDiffractionen_US
dc.subjectHolographic interferometryen_US
dc.subjectInductively coupled plasmaen_US
dc.subjectIron alloysen_US
dc.subjectMagnetic materialsen_US
dc.subjectMagnetostrictionen_US
dc.subjectMaterials propertiesen_US
dc.subjectPolyimidesen_US
dc.subjectSubstratesen_US
dc.subjectThermal evaporationen_US
dc.subjectVacuumen_US
dc.subjectVacuum applicationsen_US
dc.subjectVaporsen_US
dc.subjectCoercivitiesen_US
dc.subjectDeposition parametersen_US
dc.subjectElement concentrationsen_US
dc.subjectFace-centred cubicen_US
dc.subjectGlass substratesen_US
dc.subjectIn-plane anisotropyen_US
dc.subjectInductively coupled plasma atomic emission spectrometryen_US
dc.subjectMagnetisationen_US
dc.subjectNiFe filmsen_US
dc.subjectRigid and flexible substratesen_US
dc.subjectVacuum coatingen_US
dc.subjectMagnetic anisotropyen_US
dc.subject.scopusElectroplating; Cobalt Alloys; Magnetic Propertiesen_US
dc.subject.wosChemistry, analyticalen_US
dc.subject.wosElectrochemistryen_US
dc.subject.wosInstruments & instrumentationen_US
dc.subject.wosPhysics, applieden_US
dc.titleInfluence of deposition parameters of Novel Vacuum Coating Plant on evaporated Ni60Fe40 and Ni80Fe20 filmsen_US
dc.typeArticle
dc.wos.quartileQ4en_US
dc.wos.quartileQ3 (Instruments & instrumentation)en_US

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