Efficiency enhancement of electrochromic performance in NiO thin film via Cu doping for energy-saving potential

dc.contributor.buuauthorFırat, Yunus Emre
dc.contributor.buuauthorPeksöz, Ahmet
dc.contributor.departmentBursa Uludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.orcid0000-0003-0510-6640tr_TR
dc.contributor.researcheridAAK-5283-2021tr_TR
dc.contributor.researcheridAAG-9772-2021tr_TR
dc.contributor.scopusid57188820368tr_TR
dc.contributor.scopusid23100976500tr_TR
dc.date.accessioned2022-12-07T07:06:21Z
dc.date.available2022-12-07T07:06:21Z
dc.date.issued2019-02-01
dc.description.abstractConstruction of low-cost and high-efficiency electrochromic electrodes with high color contrast and fast response time in electrochromic applications have led to a proliferation of studies in metal oxides. This research study presents a comprehensive overview of the electrochemical synthesis of nanoporous Cu-doped nickel oxide films on ITO-coated glass substrate and its electrochromic behavior in alkaline medium. X-ray diffraction analysis and scanning electron microscopy are used to determine the phase and morphology of the produced films. The films indicate uniform and good adhesion to the substrate. The electrochromic behavior of the deposited films is tested by means of cyclic voltammetry, chronocoulometry, repeating chronoamperometry, and electrochemical impedance spectroscopy measurements. The color change from dark brown to transparent appears reversibly well suitable under sequential potential from -0.2 to +1.0 V. After the Cu atoms incorporate into the host NiO matrix, noticeably enhancements are observed in optical modulation (57.1% at 550 nm), coloration efficiency (13.78 cm(2)/C) and response time (t(b) = 2.26 s and t(c) = 1.77 s) compared to its as-prepared NiO films. Energy level diagrams including fermi level, valance band edge and conduction band edge positions are presented based on the Mott-Schottky approximation and Tauc's method using absorbance data for the NiO and Cu:NiO films. The negative slope of the Mott-Schottky plot shows p-type conductivity for the films, and acceptor density is found as 4.44 x 10(19) cm(-3) and 5.41 x 10(19) cm(-3) for the NiO and Cu:NiO films, respectively. An equivalent electronic circuit is fitted using the measured Nyquist data of the NiO or Cu:NiO semiconductor/electrolyte system, and the calculated values of the circuit elements show significant sensitivity to the Cu doping. Therefore, our results make a major contribution to the research on energy-saving smart windows by demonstrating analyses in detail.en_US
dc.identifier.citationFırat, Y. E. ve Peksöz, A. (2019). ''Efficiency enhancement of electrochromic performance in NiO thin film via Cu doping for energy-saving potential''. Electrochimica Acta, 295, 645-654.en_US
dc.identifier.issn0013-4686
dc.identifier.issn1873-3859
dc.identifier.scopus2-s2.0-85057157466tr_TR
dc.identifier.urihttps://doi.org/10.1016/j.electacta.2018.10.166
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0013468618324071
dc.identifier.urihttp://hdl.handle.net/11452/29720
dc.identifier.volume295tr_TR
dc.identifier.wos000454249800077tr_TR
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherPergamon-Elsevier Scienceen_US
dc.relation.bapKUAP(F)-2015/63tr_TR
dc.relation.collaborationYurt içitr_TR
dc.relation.journalElectrochimica Actaen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectElectrochromic thin filmen_US
dc.subjectMetal oxideen_US
dc.subjectNickel oxideen_US
dc.subjectElectrodepositionen_US
dc.subjectMott-Schottkyen_US
dc.subjectDeposited nickel-oxideen_US
dc.subjectOptical-propertiesen_US
dc.subjectSubstrate-temperatureen_US
dc.subjectCarbon nanotubesen_US
dc.subjectAnode materialen_US
dc.subjectStabilityen_US
dc.subjectChronoamperometryen_US
dc.subjectCopper oxidesen_US
dc.subjectCyclic voltammetryen_US
dc.subjectElectrochemical impedance spectroscopyen_US
dc.subjectElectrochromismen_US
dc.subjectElectrodepositionen_US
dc.subjectElectrodesen_US
dc.subjectEnergy conservationen_US
dc.subjectIto glassen_US
dc.subjectMagnetic semiconductorsen_US
dc.subjectMetalsen_US
dc.subjectNickel oxideen_US
dc.subjectScanning electron microscopyen_US
dc.subjectSemiconducting filmsen_US
dc.subjectSemiconductor dopingen_US
dc.subjectSubstratesen_US
dc.subjectThin filmsen_US
dc.subjectX ray powder diffractionen_US
dc.subjectElectro-chromic applicationsen_US
dc.subjectElectrochemical impedance spectroscopy measurementsen_US
dc.subjectElectrochemical synthesisen_US
dc.subjectElectrochromic electrodesen_US
dc.subjectElectrochromic performanceen_US
dc.subjectElectrochromicsen_US
dc.subjectMetal oxidesen_US
dc.subjectMott-Schottkyen_US
dc.subjectVanadium compoundsen_US
dc.subjectElectrochemistryen_US
dc.subject.scopusThin Films; Electrochromic Devices; Spray Pyrolysisen_US
dc.subject.wosElectrochemistryen_US
dc.titleEfficiency enhancement of electrochromic performance in NiO thin film via Cu doping for energy-saving potentialen_US
dc.typeArticle
dc.wos.quartileQ1en_US

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