The effect of Fe content in electrodeposited CoFe/Cu multilayers on structural, magnetic and magnetoresistance characterizations
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Date
2010-11
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Amer Scientific Publishers
Abstract
A series of CoFe/Cu multilayers were electrodeposited on Ti substrates from the electrolytes containing their metal ion under potentiostatic control, but the Fe concentration in the electrolytes was changed from 0.0125 M to 0.2 M. The deposition was carried out in a three-electrode cell at room temperature. The deposition of Cu layers was made at a cathode potential of -0.3 V with respect to saturated calomel electrode (SCE), while the ferromagnetic CoFe layers were deposited at -1.5 V versus SCE. The structural studies by X-ray diffraction revealed that the multilayers have face-centered-cubic structure. The magnetic characteristics of the films were investigated using a vibrating sample magnetometer and their easy-axis was found to be in film plane. Magnetoresistance measurements were carried out using the Van der Pauw method at room temperature with magnetic fields up to +/- 12 kOe. All multilayers exhibited giant magnetoresistance (GMR) and the GMR values up to 8% were obtained.
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Keywords
Electrodeposition, CoFe/Cu multilayers, XRD, GMR, Magnetic properties, Giant magnetoresistance, Chemistry, Science & technology - other topics, Materials science, Physics, Electric resistance, Electrodeposition, Electrolytes, Magnetic fields, Magnetic multilayers, Magnetic properties, Magnetic recording, Magnetoelectronics, Metal ions, X ray diffraction, Cathode potential, Cu layers, Face-centered-cubic structures, Fe content, Film planes, GMR, Magnetic characteristic, Magnetoresistance measurements, Potentiostatic control, Room temperature, Saturated calomel electrode, Structural studies, Three electrode cells, Ti substrates, Van der Pauw method, Vibrating sample magnetometer
Citation
Tekgül, A. vd. (2010). "The effect of Fe content in electrodeposited CoFe/Cu multilayers on structural, magnetic and magnetoresistance characterizations". Journal of Nanoscience and Nanotechnology, 10(11), Special Issue, 7783-7786.