Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels

dc.contributor.authorKoçkar, Hakan
dc.contributor.authorBaykul, Mevlana Celalettin
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.buuauthorŞafak, Mürside
dc.contributor.departmentUludağ Üniversitesi/Fen Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.contributor.scopusid13613646100tr_TR
dc.date.accessioned2021-11-09T07:28:07Z
dc.date.available2021-11-09T07:28:07Z
dc.date.issued2008-04-03
dc.description.abstractNi-Cu alloy films were potentiostatically electrodeposited from the electrolytes with low pH (2.0) and high pH (3.3) levels. The structural analysis of the films was carried out using the X-ray diffraction (XRD) and scanning electron microscopy (SEM) techniques. The XRD data showed that the crystal texture degree was different for the films grown at high pH and low pH. At high pH, the films have a strong (100) texture of the face-centred cubic (fcc) structure, while for the films at low pH the crystal planes are randomly oriented, as in a powder pattern of Cu (or Ni). The SEM studies revealed that the surface morphology of the films strongly depend on the electrolyte pH. Furthermore, the magnetic characteristics studied by a vibrating sample magnetometer (VSM) and magnetotransport properties were observed to be affected by the electrolyte pH. The differences observed in the magnetic and magnetotransport properties were attributed to the structural changes caused by the electrolyte pH.en_US
dc.identifier.citationAlper, M. vd. (2008). ''Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels''. Journal of Alloys and Compounds, 453(1-2), 15-19.en_US
dc.identifier.endpage19tr_TR
dc.identifier.issn0925-8388
dc.identifier.issue1-2tr_TR
dc.identifier.scopus2-s2.0-40149100946tr_TR
dc.identifier.startpage15tr_TR
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2006.11.066
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0925838806018974
dc.identifier.urihttp://hdl.handle.net/11452/22591
dc.identifier.volume453tr_TR
dc.identifier.wos000254899700006
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherElsevier Scienceen_US
dc.relation.collaborationYurt içitr_TR
dc.relation.journalJournal of Alloys and Compoundsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectNi-Cu filmsen_US
dc.subjectElectrodepositionen_US
dc.subjectXRDen_US
dc.subjectSEMen_US
dc.subjectMagnetoresistanceen_US
dc.subjectAnisotropic magnetoresistanceen_US
dc.subjectGiant magnetoresistanceen_US
dc.subjectCu/cu superlatticesen_US
dc.subjectMultilayersen_US
dc.subjectNickelen_US
dc.subjectChemistryen_US
dc.subjectMaterials scienceen_US
dc.subjectMetallurgy & metallurgical engineeringen_US
dc.subject.scopusGiant Magnetoresistance; Coercivity; Saturation Magnetizationen_US
dc.subject.wosChemistry, physicalen_US
dc.subject.wosMaterials science, multidisciplinaryen_US
dc.subject.wosMetallurgy & metallurgical engineeringen_US
dc.titleComparison of Ni-Cu alloy films electrodeposited at low and high pH levelsen_US
dc.typeArticle
dc.wos.quartileQ1 (Metallurgy & metallurgical engineering)en_US
dc.wos.quartileQ2 (Materials science, multidisciplinary)en_US
dc.wos.quartileQ3 (Chemistry, physical)en_US

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